for the peak broadening measurements, you can use Origin. you can fit every peak you want to investigate and you get the exact position, the intensity and the peak broadening in (°). Good luck 

Having just one peak is not enough for correct estimation of the instrumental contribution because usually there is some kind of the angular dependence. So the wafers are not the best choice.

If the broadening is not too small, you can try to use any standard that comes with your device for alignment (Panalytical provides a silicon plate, if I am not mistaken). Also you can anneal the same material that you plan to analyze for a long time in order to heal as many defects as possible. Both ways will probably give somewhat overestimated instrumental contribution and correspondingly underestimated broadening, but it can be enough if you need to compare a series of samples because all values will be shifted equally.

Another option is to perform the Rietveld refinement and calculate the size-strain parameters from the Lorentz contributions assuming that they are zero for the perfect material. This works quite well for Panalytical.

If you want to estimate very tiny broadening, it is better to go to 포항가속기연구소. I know that they have LaB6 and of course the synchrotron XRD will give you better resolution.

If you ever visit the Global campus of KyungHee, try to find an opportunity to meet Dr. Roman Shpanchenko from 삼성SDI. He has a lot of experience and can give you more personalized help.

Thank you very much. Alexander.

It gives a lot of help to me ^^