By last experiments, there is coated aluminum on my ITO's surface and I don't have any more ITO in the lab right now, How can I clean it from that aluminum. Just to notice, I need it for OLED fabrication.
You can use NaOH aq. solution (1M) at room temperature ─ while not prolonging etching unnecessarily ─ for the Al thin film removal over the indium tin oxide (ITO) substrate. Obviously, ITO etchants, as those discussed elsewhere at this forum, are to be avoided: https://www.researchgate.net/post/Etching_of_the_ITO/1
Dear Pouya,
For selective etching of the materials see the table of the etching solutions of different materials in semiconductor industry It seems that HCl and HF is common etch materials for both Al and ITO. There is the phosphoric acid that may be used to etch Al without etching ITO. There is another etching solutions given in the Link:
. http://www.cleanroom.byu.edu/wet_etch.phtml
wish you success.
we have seen that phosphoric acid etches IZO (not ITO) ~100nm in 10 min.
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