I have to use SU-8 3005 resist for the first layer and SU-8 2150 resist for the second layer, but following the basic protocol the second layer detaches from the silicon wafer after development phase.
Krzysztof Chmielewski I tried to master with a single layer using only the SU-8 2150 resist and it worked fine. While when I apply a first layer of SU-8 3005 and a second overlying layer of SU-8 2150, the latter comes off.
I would like to know if there are any optimizations that I need to do between one layer and another to avoid this problem.