First of all, I just try to fabricate the pure Al thin film which is deposited onto the glass and steel by e-beam technology. The thickness of the Al film is about 200nm. Then, I like to make the pure Al film totally transform into Al2O3 and at the same time is pron to good adhesion with substrate(glass and steel). Dose anyone provide some methods or comments/suggestions to me. Truly appreciation in advance.
you can use Atmosphere
Pressure Chemical vapor deposition (APCVD) and use Aluminium chloride (AlCl3) is the main compound of aluminium and chlorine and O2 were used as Al and O sources
respectively, while use N2 and Ar as a carrier gas
If it is compatible with your fabrication process, you can use the RF sputtering to deposit Al2O3 film.
If it is compatible to your deposition method you can deposit amorphous Al2O3 by ALD at 100 0C and then anneal it at 500-700 0C in air atmosphere
Annealing in air atmosphere as Mr. Shaaban suggested, or anodizing in a neutral (pH 5-7), non pore-forming electrolyte, such as borate or citrate, would be two easy methods to convert Al into Al2O3.
For this later method you can take a look at
Chem. Rev. 2014, 114, 7487−7556, dx.doi.org/10.1021/cr500002z
and references therein (i.e. refs [3, 9,10,25])
Hi Kunag ! Depending on the maximum thermal budget that you can allow in your process, the solution can be different. The highest quality aluminum oxide is always obtained by ALD process. A subsequent annealing can further improve the mechanical and optical properties but this, as said before, depends on the maximum temperature that your substrates can reach.
Cheers,
Giuseppe
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