Dear Yogesh Singh as Gourab Das says you can deposit Ti by thermal evaporation, but it is a tricky thing, at least in my experience with an old thermal evaporator (Balzers 250). Even at the maximum vacuum achievable the evaporation temperature for Ti was close to the limit of the machine.
If your goal is to achieve a layer of TiO2, you can add O2 during the evaporation process and oxidation will run directly.
Gourab Das ca i deposit tio2 from thermal ??? really ! is it possible ??? once I tried to deposit Sn O 2 but it was not depositing . What should I do ????
Indeed you can do it, however the thickness of the titanium layer obtained by thermal evaporation does not exceed 500 A ° (1). On the other hand, deposits with more interesting thiknesses were obtained by "electron-beam evaporation" (2) or "magnetron sputtered coating" (3).
(2) Surface structure and composition of flat titanium thin filmsas a function of film thickness and evaporation rate (doi:10.1016/j.apsusc.2005.01.013)
(3) Microstructural characterizations of magnetron sputtered Tifilms on glass substrate (doi:10.1016/j.jmatprotec.2008.08.004).