Well I think

The common methods for thin layer coatings are: Dip and Spin coating, depends upon type,size, condition etc.

Where as you can use coating equipment (http://www.sono-tek.com/) .

Hi. The simple way is do photolithography and expose to O2 plasma. If you don't have access to mask aligner to no problem, do as follows: spin coat AZ5214 resist, back at 95C for 90s, then use regular optical microscope with least intensity search for the region from where you want to remove graphene, expose to full intensity for 15s, and develop in AZ developer for 17s. You will see a hole, the expose to O2 plasma of 100w for 90s. remove the resist in hot acetone.

Thanks a lot Kamran

Kamran I think spin coating is better in my case because I need only thin layers of graphene on solid sheet.

Thanks a lot Abhay.

Actually I am not an expert in Graphene. Can you refer to me some publications related to this issue?

Earlier I planned to deposit Graphene on a 20 sq.mm glass sheet and then just keep it in center with only 100 sq.mm dimensions.

I want to ask that Is there any way I can only deposit graphene on 10 sq.mm area in the center of graphene? or I have to stick my earlier plan?

Please do consider that we do not have the advanced equipment because our research is more related to engineering.

Thanks again for sharing your ideas.