ZnO is grown by rf sputtering method and then I want to make it p type by introducing some gas into the furnace for doping.
Thank you for your suggestion i will try it out
You need to implant nitrogen into ZnO structure. I would recommend co-doping by gallium and nitrogen by (i) sputtering of GZO film from ceramic ZnO:Ga2O3 target in Ar/N2 atmosphere; (ii) cosputtering of ZnO and Ga in Ar/N2 atmosphere.
Is your sputtered ZnO intrinsic or doped with some element?
what are the possible methods and dopants used for p-type doping of ZnO that can give better results and high hole concentration?
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