I am trying to imprint nanostructures onto gold evaporated surface. I am using MR 7020R from Micro resist GmbH(diluted) to get 100nm resist coating . I am having trouble etching the resist residual surface after thermally imprinting the structures.
I have tried Reactive ion etching with O2, But the roughness of the resist surface after etching is around 10nm (RMS). And since my structures are around 20nm , it is impossible to differentiate between rough resist surface and the imprinted structures.
If anyone has done this before, they could tell me how they have etched the residual layer with minimum increase in surface roughness.
Thank you
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