We tried to make molds for microfluidics using the K-CL photoresist from Kloe (http://www.kloe.fr) and their masking system UV-KUB 2. In theory their photoresist is very easy to use but we found that it adheres poorly to the wafer and it peels off with the PDMS. We followed their protocol exactly, tried several tweaks proposed either by them or other groups but no success. I mention that we tested the system with SU-8 and it worked perfectly. Has anyone used this K-CL photoresist and encountered/solved similar problems?

Thank you in advance for any suggestions!