I want to measure the mobility of NiO semiconductors with the Hall effect but I don't know which contact is appropriately working. NiO thin film was grown from the RF-sputtering method.
Actually, I read some topics and I found out Ti and Ni are the best for this. But, I'm considering how to connect Ti and Ni with my sample. If I use indium solder, I am afraid this way can destruct the sample at high temperatures. Or if I use evaporation deposition (sputtering, thermal) for the contact point, I'm afraid it can turn to NiTiO3 or something like this.
Please help me and explain in as much detail as possible.
Thank you so much for that