1) During BST (Ba0.5Ti0.5TiO3) deposition on Si, SiO2, Al2O3 substrate after platinum deposition, I am getting porosity in BST sample which creating difficulty in making capacitor of BST thin film. Please let me know what parameter we can change to reduce porosity of BST thin film. I am using 300mj energy and oxygen pressure 0.4mbar during deposition and in-situ annealing.

2) I am making also BaFe12O19 on Al2O3. After annealing ex-situ i am getting well know XRD but does'nt showing FMR response.

Please let me know how can i remove these two problems

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