Hi,

I have been dealing with gold surface roughening issue after I anneal my samples at 450C for 15 min in forming gas in an RTA furnace. Attached please find images showing a few areas after gold evaporation deposition and lift-off (left) and the same area after annealing (right). The gold thickness is roughly 250 nm, and is evaporated on top of a 25 nm Ti which itself is evaporated on a 80 nm TiN film. There was no vacuum break between Ti and gold evaporation. The substrate is silicon.

I suspect I'm seeing gold reflow; although RTA is done well below gold melting point.

Any thoughts and comments on what's happening and how to prevent it are highly welcomed.

Best,

Alireza

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