Basically deposition is by Magnetron sputtering. The first nano-layer is Ni and the second nanolayer is Ti on Si substrate and consequentially proceeds to develop multi-bi-layer. After deposition these are annealed at higher temperature. Can someone suggest which deposition (single-bi-layer / Multi-bi-layer) is preferable for functional micro-structure?
Patitapabana Parida
Single bi-layer deposition is more preferred. Because having the good co - relation of shape memory effect with mechanical properties. The thickness of thin film should have to be maintained within 50 microns.
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