I want to fabricate an aluminum microcantilever to 70 micron length, 10 microns width with 1 micron thickness using MEMS on a silicon wafer. I want fabricate this to study the size effects in aluminum. I have DC sputtering machine, photolithography and spin coater. I do not have any dry etching setup but I can do wet etching.
hii guruprasad,
For fabrication of microcantilevers, first of all you require mask set. I hope you have desired set of masks for this fabrication.You can fabricate the Al cantilevers by using Surface Micromachining process. For your requirement lift-off process may not work as your Al thickness is high (1um). I think you should go for standard etch patterning of Al layer by using etching solutions like FeCl3 or Aluminum Etchant Type A (contains 80wt% Phosphoric Acid, 5% Nitric Acid, 5% Acetic Acid, and 10% DI Water). The sacrificial layer may be photoresist (+ve) itself.
@Shankar Dutta, I have the mask set and I am following the same procedure as you mentioned above. I am etching the Al with etchant type A. But how to release the structure. It would great if can elaborate what you are trying to tell.
Dear Ananth Sarathi, thanks for the pdf attachment, I will read that pdf. I have attached the pic which shows what I plan to fabricate. I need it in Al cantilever.
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