Does the plasma etching of ceramics (such as silicon nitride) to reveal the microstructure have an effect on the residual stress surrounding grains?

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Biljana Mikijelj

if etching is done with fluoride containing gases (most common) it preferentially etches the si3n4 grains relative to the grain boundaries. theoretically, it is possible that this could locally relieve some stresses in the structure, but I have not seen any published data to support it. plasma etching of hardness indentations on si3n4 samples also suggests that additional crack propagation after etching is not measurable,

Salsabeel kareem Burhan

Good work

Gerhard Keller

I would guess yes;

the question is can you measure it?