Treat your glass support with oxidizing agents such dilute chromic acid or piranha solution. This will make your glass slightly hydrophilic which will help to adhere film.

hope it works!

Dear Nurul,

Parimal`s response is a good advice if a very thorough cleaning is required.  More information are needed for more specific advices.  What is the film that you are trying to deposit on the glass? (metal?)  What is the technique that you are using to deposit the film?

In my experience, cleaning glass with acids is not necessary in most cases (alcohol, soap, DI water should be enough), but adhesion sometimes requires a bonding layer (ex: 1 nm of Cr to bond a Au layer to glass).

Apart from thoroughly cleaning your substrate, try plasma treatment of the substrate. It will not only help in better adhesion but also improve the film properties.

Which thin film material are you trying to deposit.

Which substrate are you trying to use. and

which technique are you using to deposit the thin film (evaporation/sputtering/sol gel).

Kindly specify these details to analyse your problem correctly.

K. Sreenivas

 I am also facing the same problem . but , after 4 and half hour air dried , it improved .

So , is air drying responsible to adhere the thin films on the glass substrate by using dip coating ?

Dear Parimal,

Thank you for your suggestion. How long the treatment using piranha required? and after treating with piranha, do I have to rinse the glass with water or I just can use the glass straightaway?

Dear Dr. Daniel & Prof. Sreenivas,

Thank you for your response. I tried to deposit copper using electrospinning method. 

Hi Nurul,

You can treat your glass subsrate in piranha solution from 45minutes to 1 hour. You just have to rinse with water. Also I would suggest to use distill or conductivity water to avoid other charge deposition .

Hi Parimal, 

Thank you for your suggestion. I will try the method soon. Thank you so much.

You may clean substrate in chromic acid followed DI water rinsing. If you are depositing metal by sputtering a thin layer of Cr (few nm) may be deposited before the metal. Thermal annealing will also improve the adhesion.

Surface may also be treated by plasma before metal deposition.

 Hi Prof. Anil,

Thank you for your suggestion. I will try the method. Thank you.

Hi Nazli

In some cases, UV-ozone treatment can help.

An interesting problem!  Depending on your film, you may also consider a more direct chemical treatment approach utilizing a silane end-group to improve adhesion to your material.  This is more often used in organic coatings where the silane group adheres to the glass while the pendant hydrocarbon end-group interdiffuses with the similar chemistry organic coating.

Without more information about your work, it's going to be difficult to suggest an approach.

in my experience;

firstly, you can use nitric acid or acetic acid  to etch surface

secondly, if its possible, you can heat the substrate

finally, you can use thin Cr layer before the metal deposition process  (said before Daniel Poitras and Anıl Kumar)

First clean the glass slides with soap, DI water, acetone and Isopropanol. Then the dried glass plates can be UV-ozone cleaned for a longer time, say, 45 minutes. Coat your film within 15 minutes.

To obtain adherrent films on a given substrate, despite all kinds/methods co cleaning available,

Firstly, the best possible way is to develop strong reaction at the interface. You can always deposit a thin layer of a suitable material to achieve the so called adhesion.

Secondly, when you deposit very thick films on any given substrate, the intrinsic stresses in the gown film, and the mismatch with substrate will always cause peeling of the films.

As I said a reaction extending over a thin thickness at the interface, is best philosophy to achieve good adhesion. This can be metallurgical in nature, or a chemical reaction you generate.

For example Cr-Au bi layer coating is the best example, and its physics is well understood.

there are many bilayer coatings, and even multilayer coatings, which are used to obtain strong adhesion.

K. Sreenivas

You have not specified which metal film you are depositing on the glass substrate, to suggest  a clear recipe to improve the adhesion. 

Dear Prof. K. Sreenivas,

Thank you for your reply. I'm currently trying to deposit copper on glass substrate. 

Could you please let me know ....

By which technique are you depositing 

Copper films, evaporation or sputtering ? or by some other chemical technique ?

K. Sreenivas

Prof K. Sreenives,

I'm using electrospinning to deposit the films.

Hi,

From my experience. Try thermal (around 60~120C) annealing after deposited thin film on top glass for overnight (8~12 hours).

It's help in my case which improved the adhesion for deposition of Graphene Oxide on top of glass, but not entirely solve the problem. Maybe you can find the right temperature and time.

Some of my colleague suggest to treat the glass with plasma or any chemical process.

I found that a 20 minute Boiling acetone wash was sufficient, but I deposited a-Si on the  glass with CVD, so the adhesion is good as I an extending the Si - H  and Si-) network into the second material. 

I am not aware of the electro-spinning technique, but it you sputter or evaporate a thin Ti layer on the glass, and then deposit the copper, you should have no problem, as Ti readily adheres to SiO2

Films peel because of bad interfaces (so cleaning a preparation matter) but also because of STRESS in the deposited layer. If stress is the major problem, thin films will stick and thicker layers will peel. 

You are using glass or ITO coated glass.

microscopic glass slides.. I want to deposit thin film on it