Is it true that for have a single crystal always we use of The Czochralski and Bridgman method and when we use of synthesis we arrive to poly crystal ?
If you are referring to silicon specifically, then we do not have any method that can give us single crystal deposition on arbitrary substrate. We can get single crystal growth on a single crystal silicon substrate (known as Epitaxy). Some studies have reported deposition of polySi on a single crystal silicon window and then laser annealing in specific ways to obtain near-single crystal thin films. You can anneal particular poly thin films on similar substrates to obtain single crystal thin films as well (known as Liquid Phase Epitaxy, as in the attached publication)
Article Thermal recrystallization of physical vapor deposition based...