Dear Expert,

Currently I am trying to adsorbed atomic oxygen on semiconductor Surface. I construct 5 Layer and fixed the bottom three (Asymmetric Slab). Adsorption take place successfully. However the adsorption energy I calculated is around ( -10 eV ) which is far from experimental value. Kindly need suggestion how to bring the adsorption energy value up to normal physical range?

Looking forward to hear from expert. I will be very thankful.

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