By constructed the interference set up used laser as the source
From measured the fring width B and the distance from the source to the screen D , as well as the known wave length of the laser(use cw-HeNe or any diod laser) you can find the d thickness of the film.
I think, for example, SEM (or TSEM) is used to measure the average size of nanoparticles. However, I am not sure if it used to measure the Nano-thin film of the solar cell.
Process dependent Maytham , say for solar panels of a particular panel the manufacturing stipulation based on design such as absorption / I-V/material say dopant and buffer layers etc etc give you a theoretical limit . This is then given a value by manufacturing process(s) .
use Alpha-step but into glass substrates, put glass substrates in the same coating conditions that using on the surface of titanium,and then thicknesses of deposited coatings were determined by Alpha-step.
By constructed the interference set up used laser as the source
From measured the fring width B and the distance from the source to the screen D , as well as the known wave length of the laser(use cw-HeNe or any diod laser) you can find the d thickness of the film.