I have coated a semicon device with ITO and now I want to remove this coating, but in a way that it will not harm the device.
Any ideas, references?
Thx
Depends on the materials of the semicon device. If it is a standard silicon/silicon oxide device the main thing you have to worry about is the metal interconnects and electrodes. Many acids and bases will etch ITO but will also etch aluminum which is a commonly used metal. I would try using an oxalic acid aqueous solution which is a reducing solution (again this depends on what metals are on the device). I found an old world patent application WO 2000011107 A1 which suggests just that. Other selective etches are also mentioned.
Please check also previous discussions this forum, also dealing with etching ITO film:
https://www.researchgate.net/post/Etching_of_the_ITO
https://www.researchgate.net/post/What_would_be_the_best_method_to_pattern_ITO_coating_on_PET_substrate
https://www.researchgate.net/post/Can_anyone_please_recommend_a_process_to_etch_ITO_film
The following paper may be helpful: Tzu-Hsuan Tsai, Yung-Fu Wu, "Wet etching mechanisms of ITO films in oxalic acid", Microelectronic Engineering, 83(3) 2006, pp. 536-541.
http://www.sciencedirect.com/science/article/pii/S0167931705005599
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