I want to make thin films of dielectric material over Cu electrode. Desirable properties are: High dielectric constant, high dielectric strength, high rate of polarisation, low leakage current. The film thickness will be around 500 nm. So suggest me 3 high k dielectric materials whose film can me made for electrowetting purpose. Also mention the methods by which these dielectric films can be made.
Dear Rameez Khan , A great option is porous aluminium oxide filled with columns of tantalum oxide. High wettability, high dielectric constant, high dielectric strength. For this, anodize aluminum/tantalum in a solution of oxalic or tartaric acid. See for example here:
Conference Paper Dielectric characteristics of thin film capacitors based on ...
Article Growth of Multioxide Planar Film with The Nanoscale Inner St...
- Badges
- Science topic
- Similar topics
- Chemistry
- Nanotechnology
- Nanostructures
- Thin Films