I am depositing Ti on SiO2 but when i heat this substrate to 1000-1500 °C, I am not finding any Ti layer on Sio2 Layer. What is heppening with Ti on SiO2?
Good question! Of course Ti can diffuse into SiO2 layers at such high temperatures. However, you should also consider the possibility that your Ti can completely sublime if you anneal it at 1000-1500 °C for a longer period of time. Please also have a look to the following paper available on RG!
All the best,
Thomas
EVAPORATION OF LOW-VAPOR PRESSURE METALS USING A CONVENTIONAL MINI ELECTRON BEAM EVAPORATOR,
P. Ferrari, S. Rojas, D. E. Diaz-Droguett & A. L. Cabrera
Pages 142-152 | Accepted author version posted online: 23 Sep 2013, Published online:17 Jan 2014
Diffusion is the process by which atoms or molecules move from an area of high concentration to an area of low concentration. In the context of your question, you're asking whether Titanium (Ti) can diffuse through Silicon Dioxide (SiO2) at high temperatures.
At high temperatures, materials tend to be more prone to diffusion due to increased atomic mobility. However, the diffusion of one material through another depends on various factors including temperature, concentration gradient, crystal structure, and the size of the atoms or molecules involved.
In the case of Titanium (Ti) diffusing through Silicon Dioxide (SiO2), it's important to note that SiO2 has a relatively dense and compact structure compared to the relatively large atomic size of Titanium. Additionally, the diffusion of one material through another often requires vacancies (missing atoms) in the lattice to facilitate the movement.
Given these factors, the diffusion of Titanium through Silicon Dioxide is generally not a common phenomenon at practical temperatures, even if they are relatively high. The atomic size difference, crystal structure, and other factors would likely inhibit significant diffusion of Titanium through a SiO2 barrier.
However, it's important to consider that under extremely specific conditions, such as at extremely high temperatures and over long periods of time, some limited diffusion might occur. But in most practical applications, the diffusion of Titanium through SiO2 at high temperatures would not be a significant concern.