presently, researchers do contact making of monolayer MOS2 as follows: gold were deposited onto thick layer of titanium via e-beam evaporation .Contacts were patterned using standard
e-beam lithography techniques. But carry-out these are very tedious and need instrument availability.
so, can i use silver-paste in its alternative work for electrical measurement for same result?
Metal-semiconductor junction can be of rectifying or non-rectifying type depending on the Schottky barrier height. You need to consider the work functions of your MoS2 semiconductor layer and silver paste to estimate the Schottky barrier height of the junction, and if that is going to be acceptable for your experiments.
Hello Choudhury,
if you want to contact a material, you must compare the work functions. The work function of polycrystalline silver is 2,26 eV. The work function of MoS2 varies strongly with crystal properties. So it is unclear from my point of view whether you get Ohmic or Schottky contacts. But if titanium (4,33 eV) works, silver could be a good solution. If not, I would try indium/Gallium.
With Regard
R. Mitdank
Silver paste has solvents in its composition, which is difficult to use for fine electrical contacts because the solvents make the paste easily spread out in relatively large area. It could damage some areas of your MoS2 layer. You could do gold thermal evaporation instead of e-beam gold evaporation.
Thanks a lot for clarifying my doubt and providing valuable suggestions. Thanks to K. Raja, R. Mitdank and X. Wang.
Please consider a high quality silver paste (not paint) for the task.
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