Can anyone suggest me the appropriate condition to deposit LiFePO4 on Si by RF sputtering?

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Chairul Hudaya

Dear Ade,

In my opinion :

1. Make sure that the target you use is LiFePO4.

2. If you find an amorphous state (through XRD?), perhaps you have to adjust the parameters of XRD measurement. Please bare in mind that you are characterizing a thin film, that shall be treated differently with a powder-based sample. For example, you may use a tilting technique using a low scan rate of current/

Hope these help.

Yasir Hussein Mohammed

Hi, I think the RF power is too high. So you can try 50 W Or 75 W. In addition, 15 or 30 min for sputter time is enough.

Hilda Esparza

Ade:

As said Chairul:

Make sure that the target you use is LiFePO4 and it is stable by XRD.

Sometime although you have the specific phase when you make sputtering the phase is destabilized.

The RF power depends of target diameter, 6,3,2 or 1". You did not mention it.

Alternatively, you can heat the substrate within the chamber.

Vinsensia Ade Sugiawati

Rajesh Kumar :

Thanks for your information :)

Best Regards,

Chairul Hudayah :

Dear sir,

Sorry for my late reply. Actually, i've made it sure that LiFePO4 as a target which's used well crystallized. Thanks for your suggestion, i'll try it again.

Yassir Hussein :

Hi. Maybe you're right. I used a high power that's why i tried to decrease the power yesterday but maybe it will decrease the thickness too. Moreover, if the time time of deposition is only 15 or 30 minutes. What do you think? Thanks in advance.

Best regards,

Hilda :

Actually, i worked on several variations in their parameters including heating the substrate during deposition at 150oC,250oC, and 350oC. The diameter between target and substrate is around 10 cm. After annealing, i got a pic LiFePO4 with low intensity but predominant Li3Fe2(PO4)3 and Fe3(PO4)2. I wonder why it could happen?Could you explain to me about destabilized phase in this process? Is there relation with oxidation state of Fe2+ and Fe3+? Thanks in advance.