I want to know the procedure of dip coating for the synthesis of tin oxide thin film
thin films => 10µm ??
I use TiO2 paste from Dyesol diluted or not and doctor blade procedure to have ~10µm films
use Scotch tape to have a first layer of 5-6µm of TiO2 and then do it twice
You can deposit the films by CBD method twice or more at same parameters. I think you can get your desire thickness but 10 micrometer is very thick.
What is the application? 10µm is very thick as mentioned.
You can do solgel from a precursor such as Tin tert-butoxide (Sn(OtBu)4), or possibly should look at electrodeposition if your substrate is conductive so you can deposit thick and highly crystalline layers quickly.
We deposit tin oxide thin films (300-500 nm) by a photochemical method using as precursors tin diketonate complexes previously deposited by spin-coating. More info in J. Chil. Chem. Soc., 50, (2005) 541-546. or J. Chil. Chem. Soc., 51, (2006) 950-956.
you can use ion beam technique. contact Khalid Hassan or contact the ion beam lab, physics department of University of North Texas.
Well yes you could in theory use vacuum deposition but Sandeep referred specifically to dip coating. Indeed you could probably use e-beam or even sputtering as I do (albeit for 30-500nm films) but then you have additional problems with factors such as film stress and delamination with such a thick film.
Again Sandeep, what is the application of this if you do not mind my asking?
thank you for great discussion to all respected sir..... the application is photoelectrode in DSSC, i tried by two electrode electrodeposition system but it gives tin not tin oxide, also i have no idea about CBD. Sol gel is better choice but the solution never become viscous so how could i?
Well with such a thick coating you would likely require multiple layers, so you would need to repeat the process. If dip coating specifically, upto a point you can also influence thickness by drawing (removing) the substrate at different speeds, as this influences your thickness.
What method did you attempt for electrodeposition?
for electrodeposition we use simple two electrode system with constant DC power source...but it gives tin instead of tin oxide. sir will u suggest details of dip coating... actually doctor blade is the right track but again the problem of micro cracks and adherence...
For thick films like those you're trying to deposit, and the uses you mention, may I suggest to use screen printing? This kind of technology is very simple to operate, very cheap and suitable for thick films. Another very cheap and suitable option is spin coating. Or, you mention: "photoelectrode in DSSC". Will this tin oxide films be deposited onto another semiconductor or it will be the very first layer deposited onto a different support layer? This is important, as the deposition of your film (parameters used for) will affect the material used as support.
I would use dozens cycles of Atomic Layer Deposition If I had equipment free for few weeks. On the other hand, dependin on what You want to get, I would sputter tin (PVD) and then anodize it - You can obtain nanoporous SnO2 with desired thickness and morphology.
You need to preparae a tin-based sol (for example: Sung-Soon Park, J.D. Mackenzie, Sol-gel-derived tinoxide thin films. Thin Solid Films, 258 (1995) 268–273). Depending on the type of support (porous or not porous) you should study the sol formulation by adding a proper polymer to control the rheology during the dip coating. Probably you will need to carry out several subsequent depositions in order to achieve the desired thickness.
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