hello

i have no idea about MoS2 and the substrate but for metallic catalysis you can use ethanol or acetone with ultrasonic bath before process and vacuum pump with argon-hydrogen to clean the substrate

I think, Aqua regia ( a mixture of hydrochloric acid (HCl) and nitric acid (HNO3) at a ratio of either 3:1 or 4:1) cleaning is working for your problem. Refer more and use it to clean substrate.

Dear Alimohammadi and Nadeesha,

Thank you very much for your valuable information.

Regards,

Deepa

I am not sure this is the best solution but I suggest that,

First putt your substrates in Aceton + IPA + Ethanol + DI water, 15 min ultrasonic bath for each,

Then you can use O2 plasma or UV or Ozone treatment which it perfectly cleans substrates,

Good luck!

The pirahna cleaning is best if you used bare silicon wafer. Do pirahna in 1:4 H2O2:H2So4. Take precautions while doing quite danger. Best of luck

Hi Fahad Aziz,

Thanks for your response..

With regards

Deepa

Dear mam

You can clean the SiO2/Si substrate with acetone + isopropanol + Ethanol + DI water and sonicate it 15 min for each. Finally vacuum dried the substrate.

Dear Ali and Nitin,

Thanks a lot for your kind response.