The intensity of the Graph is increasing with respect to temperature. If i plot a graph with respect to Area of that peak and temperature I observe also increase in area. what does that mean? If thin film is deposited by fix number of pulses so the amount of material deposited should be the same for every deposition which means area should be constant for every temperature?
NO Crystalinity varies with FWHM. it has increasing and decreasing trend.
as crystallinity i mean ratio between crystalline and amorphous phase, not size of crystals
Which area are you talking about? Plot the variation of FWHM with temperature. If it decreases with increase in temperature, it suggests an increase in crystallinity.
Its also possible that the surface roughness of the substrate is changing due to which XRD peaks showing intensity changes. Use SEM to see the changes in morphology and AFM to calculate roughness.
Harneet Kaur .. I did AFM .. Its roughness is changing .. increasing with respect to temperature. How come you relate the roughness with increase in intensity ?
Based on the published knowledge; At higher substrate temperatures, the migration mobility of the condensing particles on the substrate surface is more, which favors the growth of large crystallites size. Large crystallites size give rise to sharp peaks; as the crystallite size increases, the peak width reduces and the intensity increases. In the same time, with the increase in the substrate temperature some of the grains diffuse and form clusters, which results in an increase of roughness of the film’s surface.
Best regards
K. J. Patel, M. S. Desai and C. J. Panchal, Adv. Mat. Lett., 3, 410-414 (2012).
ltp.epfl.ch/files/content/sites/ltp/files/shared/protocols/XRD_E.pdf
Dear Ali Hassan Kazmi
If the intensiy and hence the area of an XRD peak is increasing with temperature, it means that the grains with that (hkl) are increasing increasing. If that is an intense peak, that particular phase related to it is indicating with temperature.
By increase, in area, I am assuming that the intensity of that peak is increasing. But the area under the peak can also increase if width incrrasing. If such thing is happening, the crystallinity is changing with temperature.
Dear Dr. Ali Hassan Kazmi
Peace be upon you
The increasing the intensity of the X-ray diffraction line means the increasing the crystallinity of the material, while increasing the area under the peak means the increasing of the crystallite size.
Usually, increasing the temperature of the substrate leads to both of increasing the crystallinity and the crystallite size.
Good luck
Dear colleague Ali Hassan Kazmi
Have a nice time and good day, Peace be up on you.
The structural, optical and electrical properties of the final obtained alloy depend on the thermal literature, heating rate, cooling rate, coating rate or deposition rate, thermal aging, physical aging, homogeneity, container type.......etc.
There are two types of annealing; fast and slow annealing. The annealing is a function of temperature of annealing, substrate type, ambient of vacuum, properties of material (physical and chemical). Structural form of the materials (amorphous, poly crystalline and crystalline). etc.
The annealing may reduces the presence of imperfections, defects or localized states. So the annealing may develop the structural properties of material; more order and arrangement are available consequently the small particle size my be joined or agglomerate to produce larger one with different sizes and different shapes. The growing process of particle size due to annealing may has different orientations.Such this enhancement of structural properties can be represented in increasing of XRD intensity and the decreasing of FWHM. Also annealing may has a negative effect on the structural properties of material such this issue is accompanied by the decreasing of XRD intensity and the increasing of FWHM.
I wish this is useful and help you.
Yours
A. El-Denglawey
- Badges
- Science method
- Similar topics
- Methodology
- Crystallography
- X-ray Diffraction