I want to create a Hydrophobic surface on a SiO2 layer by organic Silane. I tried these two materials (Trichloro(1H,1H,2H,2H-perfluorooctyl)silane, and Hexamethyldisilazane), However the water contact angle does not exceed 85 degree ( I need it to be around 110 to 120). Is there any protocol that if I follow would give me a better hydrophobic surface.
I also wanted to know if I can silanized ITO glass substrates or any other oxidized layer.
Hi, You can try using octadecyltrichlorosilane (OTS). OTS forms a good hydrophobic surface on Si substrate with contact angles around 110. You can do solution immersion or vapor deposition of OTS on hydroxylated silicon substrate.
You can also try using octdecyltrimethoxysilane for ITO glass substrate. OTS does not work very well for ITO.
In my experience vapor phase deposition of silanes vs liquid phase deposition tend to give higher contact angles.
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