Hi all,
I deposit 500nm of pt electrode on alumina using sputtering deposition. In very bizarre happening, the pt in each electrode show 1MOhm resistance! when i anneal the system up to 600degree each electrode show 15Kohm resistance after cooling. When I anneal up to 700degree the electrodes show open circuit after cooling. I think something happen in crystallization or something like that? anyone have any idea about it? How can i deposit a better layer with much lower resistance using pt and sputtering?
thanks
masoud