Actually by mistake I created a positive photomasks instead of negative photomasks and currently I have only negative SU8's photoresist. So is there any method to achieve my final targeted design? I know positive SU8 is needed for positive photomask but since it will consume a lot of time in shipment process. And, I wanted to start my procedure ASAP. So, please tell me if there is any chance of achieving my final targeted design.
For which application do you want to create a wafer with SU8?
If it's for molding, make your "negative" wafer, mold it into PDMS then use the PDMS as counter-mold.
Otherwise, could you use your positive photomask in order to fabricate yourself a negative mask you can then use for SU8? For example, pattern chromium on a quartz plate or pattern a thin, UV opaque layer on a plastic sheet.
Erum Alam I've been there before.. :) I used the image reversal process while I got my new mask situated.
https://lnf-wiki.eecs.umich.edu/wiki/Image_reversal#:~:text=Image%20reversal%20is%20a%20process,areas%20will%20be%20developed%20away.
https://www.microchemicals.com/technical_information/image_reversal_resists.pdf
good luck!
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