I am trying to remove LPCVD nitride from Si epitaxial layer using hot (150C) phosphoric acid. Anyone has experience whether the hot acid solution induces any damage on the epitaxial layer?
No damage, Si is very stable material.
Merhaba Oktay abi email adresine ulasamadim, ben de thin film ile ilgili calisma yapiyrum yeni basladim sayilir
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eger bana mail atma sansiniz olursa sizin bilgilerinizden faydalanmak isterim..
saygilarimla
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