I have been using Au(150nm)/Ti(20nm) on Si wafer for doing Pt electrodeposition. If I am getting irreproducible results (variation in Pt electrodeposition across several e-beam evaporated Si strips), can I use the OCP test as a measure to show the uniformity of the samples? Can OCP differ from one part of the sample to the other part of the sample on an e-beam evaporated gold? OCP was done in 0.1 MHClO4 vs Ag/AgCl/KCl(1M).
Would be highly thankful if you can put up references corresponding to your answers/suggestions.
Regards,
Khantesh