In thin film devices, particularly organic solar devices, some of the research articles have followed the procedure of exposing ITO substrates to UV-ozone irradiation after cleaning, while some other articles have skipped this step. Why?
ITO glass cleaning by just dipping in acetone, IPA etc., and then wiping it with a tissue papers is not enough. It can always leave some organic residue on the substrate surface.
Vapor degreasing is a standard technique, and when it is done for one or two hours, it yields clean substrates. Does not require any kind of wiping with tissue paper etc.,
Therefore besides the above solvent cleaning:
UV-Ozone cleaning is another method which effectively removes molecular organic contaminants.
It involves: (1) Ozone generation, (2) Ozonolysis, and (3) decomposition of orgtanic matter, and in this technique high unstable active oxygen which linked to organic compounds result in oxidative decomposition such as H2O, Co2, and and Nox.
So these additional advantages one gets by UV-ozone cleaning of substrates.
K. Sreenivas
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