Let me clarify your question, you are asking about growth or deposition rate, and basically in standard cases. there is a direct proportionality between Ar flow rate and the deposition rate, as when the flow rate increases the velocity of the atoms increases leading to more ionized atoms
moreover, many other factors affecting the deposition rate like power and working pressure, this graph shows a closer look at your question and I quote"The higher speed argon atoms could take the sputtered
target atoms away more easily so that some low energy
atoms could not reach the substrate, especially at long
target-substrate distance in our sputtering system, causing
the growth rate dropped with the increasing flow rate."
Lu, L., Shen, H., Zhang, H., Jiang, F., Li, B., & Lin, L. (2010). Effects of Ar flow rate and substrate temperature on the properties of AZO thin films by RF magnetron sputtering. Growth, 8, 9.
I also attached three files that will make a lot of clarification for factors affecting this
I hope this helps
regards
- Badges
- Science topic
- Similar topics
- Physical Sciences
- Materials Science
- Thin Films and Nanotechnology