While simulating InAlAs/InGaAs/InP HEMT in silvaco, the electron concentration in the channel seems very low in spite of a-Si delta doping(3E-12/cm2 equivalent in cm3 is 10^19). The delta doping is given as generic donors/acceptors in the base impurities. The resulting drain current is also quite low.
Can anyone suggest a cause and solution for this?
Since am new to silvaco, I couldn't exactly point out a possible cause for this
Is it an error in meshing /doping/used physical model/method
have used
material align=0.6
model conmob fldmob srh
and numerical method as method newton itlim=20 trap maxtrap=8