Both alcohol and acetone are commonly used to clean the substrates. Some times even chromic acid is used by some researchers to make the substrate surface rough. Since chromic acid is corrosive, it will roughen-up the glass surface enhancing the adhesion of films. This is particularly useful for chemically deposited films.
Both alcohol and acetone are commonly used to clean the substrates. Some times even chromic acid is used by some researchers to make the substrate surface rough. Since chromic acid is corrosive, it will roughen-up the glass surface enhancing the adhesion of films. This is particularly useful for chemically deposited films.
To be honest I would use both. I deposit films by AACVD and clean all glass substrates with the following regime:
-water+ detergent (washing up liquid)
-IPA
-Acetone
(repeat this twice) then dry with a heat gun.
It will of course depend on your deposition technique but that should leave you with clean dry glass without grease marks or impurities which may inhibit thin film growth.
Similar to the last answer. We didn't want chromium ions on our glass, so we started with factory "clean" glass slides. Assumed glass was largely organic/protein free; then dipped in 95cc 95% ethanol combined with 5cc of reagent hydrochloric acid. Rinse in distilled water.
the cleaning procedure should be started by cleaning the substrate by soap and normal water. Then put the substrate in the acetone bath in ultrasonic for 10 min followed by IPA for 10 min. After that, clean the substrate by DI water many times.