The conditions I used for the electrodeposition are mentioned below.

Electrolytic solution:

30gms of CuSO4

5ml of H2SO4

150ml of DI water

Electrodeposition parameters:

Current density - 0.25mA/mm2

The voltage at the beginning was 0.4V and started increasing gradually. After three and a half hours, there was a change in resistance with a yellow color formation on the anode and voltage started fluctuating. It suddenly rises to 16V and then drops to 8V.

May I know what's wrong with my approach? And can you suggest me the best approach to deposit 150-175 microns of copper on copper?

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