The conditions I used for the electrodeposition are mentioned below.
Electrolytic solution:
30gms of CuSO4
5ml of H2SO4
150ml of DI water
Electrodeposition parameters:
Current density - 0.25mA/mm2
The voltage at the beginning was 0.4V and started increasing gradually. After three and a half hours, there was a change in resistance with a yellow color formation on the anode and voltage started fluctuating. It suddenly rises to 16V and then drops to 8V.
May I know what's wrong with my approach? And can you suggest me the best approach to deposit 150-175 microns of copper on copper?