Hi
Have anybody tried using protective metal layer to etch oxide using vapour HF? We recently tried with TiO2 thin film protecting by Chromium of 100nm thickness. Unfortunately all chromium gone therefore the my device could not withstand. I was in a notion chromium is protective metal for vapor HF. Apparently it is not. The chromium was deposited by Ebeam evaporation in this case. I am not sure whether it is an issue with adherence of chromium. Kindly share your experience if you have faced similar issue and possible solution. However, I can not use gold in this case.
Thanks
Ankur
Hi Ankur!!!
Hey did you try removing material using excimer instead of chemically?
We have been doing that and it works great.
Cheers,
Ankit
Ankit
Thanks for your answer. But it work for us. It has several litho steps and we have tiny devices into it. Putting excimer will damage everything in no time.
But thanks for the input which may help me in future for something else.
regards
Ankur
You could try using a thin lead coating, I understand lead is at least fairly HF resistant.
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