Actually, I'm having two ZnS targets, one is with Cu backing plate and another one is without backing plate. Previously I'm using ZnS target without backing plate [total thickness- 3mm], it was working nicely in RF sputtering later it was broken. So now I'm trying to coat by using ZnS with Cu backing plate [total thickness- 6mm(3mm ZnS, 3mm Cu)] but plasma is not coming, even reflected power comes zero or sometimes fluctuating. What might be the reason or please suggest some ways to rectify this problem.
Sometimes when you deposit samples, the materials get deposited on the heater area also. If the materials are conducting and make a short contact between the heater wires then it is difficult to get the required plasmon. The first steps which I recommend are to clean the chamber carefully, sandpaper rubbing, vacuum cleaner, then ethanol. Try to check the electrical resistance between several parts, I if there is any short circuit then try to maintain it. Finally, but most important is the power supply. I hope it will be working fine. If possible restart the system once. It will work for sure. Else, you can share the picture, I will try to help as we also have the RF sputtering machine and it sometimes gives trouble which we solved by step by step troubleshooting technique.
Dear, if you see that reflected power is zero I strongly suspect that you have a short-circuit… When chamb is open, Have you checked with a tester that the target is electrically isolated from ground ? If the thickness of copper backing plate and target is high you could have ground shield touching the target or clamping ring. Male this check first… BR. Simone
You do not have plasma because you have conductive copper on the back of the ZnS target.
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