I would like to know the effect of tri-sodium citrate on the electrodeposition of Cu(In, Ga)Se2 thin-films. Also, how does it affect the deposition of elemental Cu? I have gone thorough several references but couldn't really conclude anything. Could somebody explain and share any relevant references.
Generally, complexing agents are surrounding metal ions to be electro-deposited, because metal ions are very easy to form oxides or other un-expected compounds. In some cases, un-expected compound means the self-decomposition of working bath. Consequently, complexing agent can help the metal ions adsorb on the substrate.
The presence of additives influences the physical and mechanical properties of electrodeposits such grain size, brightness, internal stress, pitting and even chemical composition. Depending on the nature of the additives they can form complexes with the metals ions making the reduction of such metals more difficult or they can inhibit the metal nucleation by adsorbing at the electrode surface.
dear shree kanth
we do complexing to increase current efficiency , throwing power and to alloy deposit
complexing will postpone H2 evolution.,
read The bible A.Brenner vol1 and 2
(a person with 46 years in electrochemistry suggesting this)
- Badges
- Science topic
- Similar topics
- Correction