Hello,
I synthesized mesoprous carbon nitride. After getting XRD test, I found that there are some impurity in my sample. After checking with different software, I found that these impurity is related to ammonium hexafluorosilicate.
I used silica nanoparticles (Ludox HS40, Aldrich) as a template and Ammonium bifluoride for removal of silica.
At the end of procedure, my sample centrifuged and washed with distilled water.
how can i remove these impurities from my sample?
Dear, Amanj Kheradmand
In template method, some times its difficult to remove silica particles from graphitic carbon nitride g-C3N4. That's why you are observing impurities in your samples.
Try to dissolve silica template in ammonia hydrogen difluoride, no need to follow initial steps, just try to treat your present sample. I hope, it will help you wash template from g-C3N4 network.
If you want to make porous g-C3N4, then you can also use Ammonium carbonate. its very simple and one step method. It will also save your time. For this you can follow this article.
Article Easily and Synchronously Ameliorating Charge Separation and ...
synthesizing mesoporous graphitic carbon nitride by hard template involve post detemplating process to remove the template......if Ammonium bifluoride is not working, you can try using hydrofluoric acid .....or you can still go ahead with Ammonium bifluoride but u need to the increase the detempalting time and if possible raise the temperature..
Thanks
actually, after washing my sample with water and ethanol, peak around 700 for FTIR test disappeared.
I want to try find out that this peak is related to residual silica template or not.
For this you can read following article
Article Facile Fabrication of Novel SiO2/g-C3N4 Core-Shell Nanospher...
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