Thanx, although I am not using full power। Can you please explain what kind of substrates you are using?

Below are the details for setting that we usually use:

#Excitation Wavelength: 532.32 nm #Laser Current: 100 % #Excitation Power: 1.01 mW or 3.00 mW or 5.00 mW #ND Filter : 0.41 % (132/255) or 1.26 % (161/255) #Spectrograph Center Wavenumber: 700.00 cm-1 #Grating: 1200 gr/mm  #Slit width: 50 um  #Exposure Time: 3 s or 5 s or 10 s #Averaging: 3 or 10 #Readout speed: 2 MHz, Gain: High, Readout port:  Low Noise, CCD temperature: -70 #Optical Line Shaping mode OFF #Objective Lens: LU Plan Fluor x100/ NA 0.9 #Measurement Mode: Point #X axis (wavenumber): Calibrated #Wavenumber Shift compensation (cm-1): 0