Does nanosphere lithogrpahy requires sophisticated and expensive devices?
That strongly depends on what you intend to do with the mask. Making the nanosphere mask doesn't require advanced equipment - that's the main advantage of the technique.
However, the next step may require more tools. For example, if you intend to deposit a material through the mask by evaporation or sputtering, a vacuum chamber with the required heating/sputtering accessories will be required.
It is no need to use a sophisticated instruments for obtaining a simple covering from polystyrene spheres (PS). It is easy to obtain some mm2 area with monolayer of say one μ PS. You should only provide a cleanness of a substrate and its good wetting with the PS suspension. But with the smaller PS this process become more complicated. And the covered with PS area structure is not controlled in the case of simple preparation. Some part of area will be one PS thickness, another – with two PS, three PS and so on. It is need of special equipment to control the thickness of PS in covering and its quality. It is described in “Advances in Contemporary Nanosphere Lithographic Techniques” Journal of Nanoscience and Nanotechnology Vol.6, 1–15, 2006
I suggest you this reading.
http://iopscience.iop.org/article/10.1088/0957-4484/17/5/028/meta;jsessionid=816749577789BC3FF5BAD172626C99B8.c4.iopscience.cld.iop.org
Best. L.
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