When using the Kurt J. Lesker Co (R301/MC2) for Sputter deposition of AZO, at the process pressure of 2 mTorr, Forward power of 146 W, Reflected power- 5 W and RF power of 150W, the normal DC bias is around 100 V. Recently it has started to change and keeps on increasing. The same process recipe is now resulting in AZO films with sheet resistance 5x higher. I want to know possible causes and remedies for this.
Jeshias,
has any possible source of RF disturbance been installed in close proximity? I'm just considering unintended demodulation of the RF by the sputter control electronics. This might give you a steady DC-offset in its control. Will change when turning on and off nearby equipment.
@Mart, no, there hasn't been any change in the equipment set-up in the lab. The closest tool is a similar one we use for molybdenum sputter deposition. Besides the ZnO source is working just fine.
We opened the chamber this morning and found out there was a problem with the cathode cooling water line. It seemed blocked but I am not sure if this was the cause. I hope we will know soon after running a dummy deposition.
Hello Gwamuri,
Were you able to find the problem, that causes an increase in DC bias. Reason I am asking is that I have a similar issue but in my case, DC bias has dropped
Thanks
sahil
@Sahil Sharma: The DC bias drops over time in magnetron sputtering when the target erodes. The thinner the target gets, the higher the magnetic field on the surface, the lower the DC bias. YOu can use the DC bias to find out when it is time to change the target.
I have simillar problem, but in my case the bias decreased from 190 V to 5 V. I checked for magnetic properties of magnets and they are all working well. I am using 400 W for a tungsten target (Kurt J Lecker) and the target is new and it is working on other magnetrons. What can be the possible reason that the magnetron is not working properly?
Thank you
Our problem is that by supplying power to the Titanium target, the bias voltage supplied to the substrates is reduced from -90V to -30V, and we have not identified the reason. Does anyone have a similar experience?
Both the voltage applied to the target and the substrates is DC
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