Graphene is sensitive to plasma power. Many groups are synthesizing composite materials by thermal evaporation. As thermal evaporation offers minimum transfer of energy during deposition, it is preferred. Certain materials require high dosage of energy for thin film deposition and require a plasma medium to initiate the deposition. This plasma has two effects: etching and depositing. If etching is dominant over deposition, then the pattern present on the substrate will be altered greatly and thus results in poor patterned films.
Laxman Raju Thoutam
Thanks Zhu for your suggestion. Do you think Magnetron sputtering will be good over DC sputtering?
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