The most common method to fabricate thin film is using deposition techniques.
There are different deposition techniques: The physical and chemical deposition techniques. In the physical deposition the material is evaporated and condensed on the substrate in vacuum chamber. There is also the chemical vapor deposition where the reacting materials in the gas phase react together to produce the deposited material. This method is used on wide scale in the industry.
There is also spin on from liquids as in the organic semiconductors or perovslkites. Layers can be deposited using electrochemical reactions .
There are books about the technology of the thin films you search the web for them. You can also refer to the the book of S M Sze of VLSI technology.
As Abdelhalim said, there are so many deposition techniques now a days. Its depends on the availability and deposition parameters. you can choose the suitable one deposit the thin films with different junctions. I wish you good luck.