What are some alternative etchants for Silicon Nitride?

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Can we mark 'EFL Learners shifting from general digital to AI technologies' as technological transition?

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How to generate a citation of my paper from ResearchGate?

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Does Anyone have expertise in in vitro transcription and RNA pull down assay?

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How to fix background error in rietveld refinement of one XRD peak using GSAS-II?

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How can I add own Henry coefficients in Aspen Plus?

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Why might the impedance values for DI water and 0.1X PBS buffer solution exhibit a decreasing and increasing trend, respectively over time (HP 4194A)?

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Can usage of AI tools like chat GPT in research work is recommendable ?

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Usage of internal standards in LC-MS/MS analysis?

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ANY free software for reconstructing neurons in the microscopic image?

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How effective is the Citi Bloc standard basket in enhancing the accuracy and comparability of international construction cost assessments?

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Which solvent is better to dissolve with secondary metabolites extracted from fungi?

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In the presence of VERY high concentration (1000 ppm) of silicon, the adsorption isotherms of arsenic are showing anomalous trends, why so?

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Why methanol and sulphuric acid used in the analysis of polyhydroxyalkanoates (PHA) by GC-MS?

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What is the solvent system required to run tlc for calixarenes?

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Convergence of absorbency values to determine the total phenolic content of several solvents?

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Jenan Sattar Kashan

You can see the link below

https://ieeexplore.ieee.org/document/6235295/?part=1

Regards

Chandra Bhal Singh

The chemical dry etching of silicon nitride (Si3N4) in a downstream plasma reactor using CF4 , O2 is useful.

Read the attached articles

http://www.microtechweb.com/kb/nit_etch.htm