This method is commonly used in fabrication of carbon/diamond thin films and its proven to enhance the deposition rate, but how can it enhance the deposition rate?
What happens to the gas kinetics, and can anyone explain the the charge carrier transport of the hydrocarbon gas when voltage is applied?
some literature that ive been referring to:
1. 10.1016/j.surfcoat.2007.09.051
2. 10.1088/0953-8984/13/13/314
3. 10.1016/0925-9635(93)90092-G
Applied voltage on the substrate plays an important role and as well as the deposition time. One has to adjust the voltage/power and the deposition time and also the carrier inert gas flow rate.
Due to applied potential, electrons present on the substrate start to oscillate. When the frequency of vibration matches with the frequency of gas molecules, it allows those source gas molecules to decompose on the substrate. Ultimately the rate of deposition increases. Hope it will help to explain the theory.
Thanks
Any papers or any references regarding your answer so that i could study more ? Anamika Kadam
Dear Amir,
This is the logical answer that I gave from my theoretical studies. Please refer some electrochemistry related books. You will get references.
Thanks
The positive bias
voltage is applied to the substrate or to the ring electrode near the substrate.
The bias voltage has been 100 to 400 V, with a current flow of 0.5 to
5 A. The change in the appearance of the plasma jet with the bias is shown
in Fig. 50. It is clear from Fig. 50b that a glowlike discharge extends from
the tail of the plasma jet to the substrate, and the optical emission from the
plasma jet is significantly enhanced especially near the substrate. The discharge
changes to a transferred arc mode when bias is further increased, and
because the transferred arc causes significant electron heating of the substrate,
the substrate becomes overheated.
Jes Assumen, D. Reinhard, Diamond films handbook, Page 197
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