The growth of MnSi thin films can be achieved through several methods: MBE, sputtering, and CVD.
Here's a general overview of how you might grow MnSi thin films using MBE, for example:
Substrate Preparation: The choice of substrate is crucial for the growth of high-quality thin films. Si(111) is commonly used for MnSi growth. The substrate is cleaned to remove any surface contamination.
In an ultra-high vacuum chamber, separate effusion cells containing high-purity manganese and silicon are heated to produce atomic beams. These beams impinge on the substrate, where they react to form MnSi.
The growth of MnSi thin films is highly dependent on the growth parameters, such as the substrate temperature, the beam flux ratios, and the growth rate. These parameters need to be carefully controlled to optimize the quality of the MnSi films.
Yet... sputtering, and even CVD can be used too, depending on your application requirements.
May I recommend you to have a look at section 4 of this review article to explore various methods:
Article A Review on 1-D Nanomaterials: Scaling-Up with Gas-Phase Synthesis