I have CVD grown Graphene on two sides of the Ni foil. I have tried O2 plasma (Ar 15 sccm & O2 5 sccm) with 150 W power for about 5-10 mins (multiple trials) to remove graphene from one side so that the Ni can be etched with 1 M FeCl3 solution (suggested in multiple papers). I coated the other side with PMMA solution and placed the sample on the FeCl3 solution. However, even after several days the sample with Ni foil floats on the surface. It seems like the sample has become more flexible (maybe indicating Ni layer reduction) but it is not completely gone as it should have in a couple of hours. I would really appreciate any insights on this. Thanks.
What is the volume of FeCl3 solution? You need to make sure the total amount of Fe ions is enough.
- Badges
- Science topic
- Similar topics
- Engineering
- Materials Engineering
- Coating